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Latest products for OLED displays (for processes below 100 degrees Celsius)
This product has been developed as a peripheral material for OLEDs.
It is characterized by high transmittance and 100°C curing.
It can be used in a bake temperature process of 100℃ or less.
| Procut name | Application | Photo lithography |
Characteristics |
|---|---|---|---|
| FOC-HR8 | High-Refractive | None | n=1.70 (at 633nm) |
| FNPR-HR7 | High-Refractive | Negative-tone | n=1.66 (at 633nm) |
| FNPR-LR5 | Low-Refractive | Negative-tone | n=1.33 (at 633nm) |
| FOC-LS100-TM300 | Coating under colofilter | None | PFAS free |
| FOC-LS100 | Coating over color filter & Final lens | None | PFAS free |
| FPPR-FL | Hard mask | Positive-tone | Hard mask resist for etchback |
| FNPR-CE | Overcoat | Negative-tone | |
| FT-CV20 | Sealing | None | n=1.52 (at 633nm) Non-solvent |
For inquiries, please send an email to this email address below.
info@fcfuji.co.jp
A CORPORATE PROFILE
| FUJI CHEMICALS INDUSTRIAL CO., LTD. | |
| Address | 3-24-11 Nishiazabu, Minato, Tokyo, 106-0031, Japan |
|---|---|
| Establishment | May, 1951 |
| President | Mr.Yuji Kosuga |
| Capital | 66 Million Yen |
| Revenue | 1.7Billion Yen (2016 Fiscal Year) |
| Business Office | Head Office |
| 3-14-10 Toyotamakita, Nerima, Tokyo, 176-0012, Japan | |
| Tel: 81-3-3557-6201 Fax: 81-3-3557-6205 | |
| Osaka Branch | |
| 22-1, Toyotsucho, Suita, Osaka, 564-0051, Japan | |
| Tel: 81-6-6384-1351 Fax: 81-6-6389-3221 | |
| Factories | Fuji Oyama Factory |
| 333-7, Sunkawabata, Tanagashira, Oyamacho, Suntou-gun, Shizuoka, 410-1327, Japan | |
| Odawara Factory | |
| 5-3-51, Higashicho, Odawara, Kanagawa, 250-0003, Japan | |
COMPANY HISTORY
| 1951 | Founded Fuji Chemicals Industrial Co.,Ltd. |
|---|---|
| 1953 | Built Sakawa Facilities, Began production of photo resist and chemicals for plate makings |
| 1955 | Began production of photo resist sales to electric industries users. |
| 1970 | Built Higashimachi Facilities, Began production of PS plates for offset printing. |
| 1984 | Developed and sales of photo resist FUR for CCD Color Filter. |
| 1985 | Developed and sales of Lift-off resist LMR for LSI. |
| 1987 | Developed PS Plate LKN-WP for projection plate making system. |
| 1988 | Established Head Quarter at Nerima-ku in Tokyo. |
| 1989 | Built Fuji Oyama Facilities, Began production superfine photo resist. |
| Developed and sales of None chromate photo resist FR-93 for CCD Color Filter. | |
| 1993 | Developed and sales of Micro-Lens PMR for CCD. |
| 1999 | Photo resist production division of Fuji Oyama Factory obtained ISO9002 certification. |
| 2000 | Developed and sales of over coat FOC-M type for Image Sensor. |
| 2002 | Developed and sales of Micro-Lens new type PMR-NT for Image Sensor. |
| Fuji Oyama Factory certification ISO9001-2000 from ISO9002 | |
| 2003 | Developed and sales of very thickness FPPR-HW2 for Image Sensor. |
| 2004 | Developed and sales of under coat FOC-UV type for Image Sensor |
| 2006 | Developed and sales of Micro-Lens PMR-V for Image Sensor |
| 2007 | Fuji Oyama Factory obtained ISO14001 certification. |
| 2008 | Developed and sales of Micro-Lens FTSR type for Image Sensor |
| Head Office obtained ISO9001-2000 Quality Certification | |
| 2009 | ISO9001-2008 from ISO9001-2000 |
| 2010 | Developed and sales of Micro-Lens NDR-4 for Image Sensor |
| 2011 | Developed and sales of the model for Micro-Lens FPPR-BL for Image Sensor |
| 2012 | Release formaldehyde free etching back ML “FTSR-L” and etching back HM “FPPR-CL” |
| 2013 | Sales of OC “FOC-375-80”, EBML“FTSR-L” and “FPPR-CL” |
| 2014 | Developed and sales of high etchrate and high light stability Micro-Lens “FTSR-U” for Image Sensor |
| 2015 | Developed high refractive index micro lens “FOC-IM52/IM71” for Image Sensor |
| 2016 | Developed etching back HM “FPPR-EL” for KrF |
LINE OF BUSINESS
Presensitized Offset printing plate (Positive and Negative).
Photosensitive coating Solution for PS Plate (Positive and Negative).
Photosensitive coating Solution for Photofabrication.
Example: FMR serise for pad printing process, semiconductor process and other photofabrications.
: FR-15 series, aqueous photo resist for metal etching.
Various related chemicals.
Example: FDW serise, environmentally friendly type fountain solutions for off-set printing.
